TY - JOUR
T1 - Grating-coupled light emission from the slow mode of metal-insulator-metal tunnel junctions
AU - Ushioda, Sukekatsu
AU - Uehara, Yoichi
AU - Takada, Masatoshi
AU - Otsubo, Koji
AU - Murota, Junichi
PY - 1992/7
Y1 - 1992/7
N2 - We have observed the direct light emission from the slow mode of surface plasmon polaritons (SPP) of metal-insulator-metal (MIM) tunnel junctions formed on a ultra-fine grating. The grating (period=100 nm, groove depth=12 nm, area=200 µm×200 µm) was created on a Si(100) wafer, using a direct electron beam lithography technique and wet etching of SiO2 The MIM junction was formed by evaporation of Al and Au films on this grating. The emission peak for the Al-Oxide-Au junction was observed at 1.55 eV that is expected from the dispersion curve of the slow mode. The spectral width is appreciably narrower than the emission due to the natural residual micro-roughness of the junction.
AB - We have observed the direct light emission from the slow mode of surface plasmon polaritons (SPP) of metal-insulator-metal (MIM) tunnel junctions formed on a ultra-fine grating. The grating (period=100 nm, groove depth=12 nm, area=200 µm×200 µm) was created on a Si(100) wafer, using a direct electron beam lithography technique and wet etching of SiO2 The MIM junction was formed by evaporation of Al and Au films on this grating. The emission peak for the Al-Oxide-Au junction was observed at 1.55 eV that is expected from the dispersion curve of the slow mode. The spectral width is appreciably narrower than the emission due to the natural residual micro-roughness of the junction.
KW - Electron beam lithography
KW - Light emitting tunnel junction
KW - Si
KW - Surface plasmon
KW - Ultra-fine grating
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U2 - 10.1143/JJAP.31.L870
DO - 10.1143/JJAP.31.L870
M3 - Article
AN - SCOPUS:0026898888
VL - 31
SP - L870-L873
JO - Japanese Journal of Applied Physics, Part 1: Regular Papers & Short Notes
JF - Japanese Journal of Applied Physics, Part 1: Regular Papers & Short Notes
SN - 0021-4922
IS - 7
ER -