Grain size reduction by utilizing a very thin CrW seedlayer and dry-etching process in CoCrTaNiPt longitudinal media

Satoru Yoshimura, D. D. Djayaprawira, Tham Kim Kong, Yusuke Masuda, Hiroki Shoji, Migaku Takahashi

研究成果: Article査読

14 被引用数 (Scopus)

抄録

To decrease grain size and grain size distribution in CoCr15Ta3.5Ni10Pt5/Cr longitudinal thin film media, a very thin CrW54 seedlayer combined with a dry-etching process were utilized. In the media dry etched after CrW54 deposition, utilization of 1.5 nm CrW54 reduces the grain diameter and σ to 9.4 and 2.2 nm, respectively. By optimizing CrW54 seedlayer thickness and dry-etching process, grain diameter and σ of the magnetic layer can be reduced while maintaining coercivity, longitudinal orientation of magnetic grains, and magnetic interactions.

本文言語English
ページ(範囲)6860-6862
ページ数3
ジャーナルJournal of Applied Physics
87
9 III
出版ステータスPublished - 2000 5月 1

ASJC Scopus subject areas

  • 物理学および天文学(全般)
  • 物理学および天文学(その他)

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