Graded composition and valence states in self-forming barrier layers at Cu-Mn/ SiO2 interface

Y. Otsuka, J. Koike, H. Sako, K. Ishibashi, N. Kawasaki, S. M. Chung, I. Tanaka

研究成果: Article査読

44 被引用数 (Scopus)

抄録

A self-forming diffusion barrier (SFB) layer was formed at Cu-Mn/ SiO 2 interface. Spatial variation of the chemical composition and valence state of the elements in the SFB was investigated in a subnanometer resolution using electron energy loss spectroscopy and transmission electron microscopy. The SFB was found to have a layered structure with graded compositions of nanocrystalline MnO and amorphous MnSiO3. The valence state of Mn was found to be +2 in the MnO layer and gradually increased to +3 in the MnSiO3 layer. The reported dielectric constant of the SFB could be explained by the observed composition and microstructure.

本文言語English
論文番号012101
ジャーナルApplied Physics Letters
96
1
DOI
出版ステータスPublished - 2010

ASJC Scopus subject areas

  • 物理学および天文学(その他)

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