Geometrical confinement of a domain wall in a nanocontact between two NiFe wires

Kosaku Miyake, K. Shigeto, K. Mibu, T. Shinjo, T. Ono

研究成果: Article査読

52 被引用数 (Scopus)

抄録

A nanocontact structure (typically 22×34 nm2) between two NiFe wires was fabricated by an electron-beam lithography and a lift-off method, and the magnetoresistance was measured. The magnetization switching process was artificially controlled by engineering the sample geometry to realize a magnetic structure with a single domain wall (DW) trapped in the nanocontact area. This domain structure was confirmed by magnetic force microscopy observations. The magnetization rotation of 180° was realized within the nanocontact area. The contribution of the DW to the resistance was negative, which can be understood on the basis of anisotropic magnetoresistance.

本文言語English
ページ(範囲)3468-3470
ページ数3
ジャーナルJournal of Applied Physics
91
5
DOI
出版ステータスPublished - 2002 2 15

ASJC Scopus subject areas

  • Physics and Astronomy(all)

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