抜粋
A high-performance neutral-beam etching system, which minimizes radiation damage caused by charge buildup or ultraviolet and x-ray photons during etching, was discussed. It was found that the bottom carbon plate of the etching systems possessed numerous aperture for extraction of neutral beams from the plasma. The analysis showed that the neutralization efficiency of negative ions and maximum neutral flux density were 100% and 4.0 mA/cm2 respectively.
| 元の言語 | English |
|---|---|
| ページ（範囲） | 1566-1573 |
| ページ数 | 8 |
| ジャーナル | Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films |
| 巻 | 20 |
| 発行部数 | 5 |
| DOI | |
| 出版物ステータス | Published - 2002 9 1 |
ASJC Scopus subject areas
- Condensed Matter Physics
- Surfaces and Interfaces
- Surfaces, Coatings and Films
フィンガープリント Generating high-efficiency neutral beams by using negative ions in an inductively coupled plasma source' の研究トピックを掘り下げます。これらはともに一意のフィンガープリントを構成します。
これを引用
Samukawa, S., Sakamoto, K., & Ichiki, K. (2002). Generating high-efficiency neutral beams by using negative ions in an inductively coupled plasma source. Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films, 20(5), 1566-1573. https://doi.org/10.1116/1.1494820