抄録
A high-performance neutral-beam etching system, which minimizes radiation damage caused by charge buildup or ultraviolet and x-ray photons during etching, was discussed. It was found that the bottom carbon plate of the etching systems possessed numerous aperture for extraction of neutral beams from the plasma. The analysis showed that the neutralization efficiency of negative ions and maximum neutral flux density were 100% and 4.0 mA/cm2 respectively.
本文言語 | English |
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ページ(範囲) | 1566-1573 |
ページ数 | 8 |
ジャーナル | Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films |
巻 | 20 |
号 | 5 |
DOI | |
出版ステータス | Published - 2002 9月 |
ASJC Scopus subject areas
- 凝縮系物理学
- 表面および界面
- 表面、皮膜および薄膜