Generating high-efficiency neutral beams by using negative ions in an inductively coupled plasma source

Seiji Samukawa, Keisuke Sakamoto, Katsunori Ichiki

研究成果: Article査読

163 被引用数 (Scopus)

抄録

A high-performance neutral-beam etching system, which minimizes radiation damage caused by charge buildup or ultraviolet and x-ray photons during etching, was discussed. It was found that the bottom carbon plate of the etching systems possessed numerous aperture for extraction of neutral beams from the plasma. The analysis showed that the neutralization efficiency of negative ions and maximum neutral flux density were 100% and 4.0 mA/cm2 respectively.

本文言語English
ページ(範囲)1566-1573
ページ数8
ジャーナルJournal of Vacuum Science and Technology A: Vacuum, Surfaces and Films
20
5
DOI
出版ステータスPublished - 2002 9月

ASJC Scopus subject areas

  • 凝縮系物理学
  • 表面および界面
  • 表面、皮膜および薄膜

フィンガープリント

「Generating high-efficiency neutral beams by using negative ions in an inductively coupled plasma source」の研究トピックを掘り下げます。これらがまとまってユニークなフィンガープリントを構成します。

引用スタイル