Generating high-efficiency neutral beams by using negative ions in an inductively coupled plasma source

Seiji Samukawa; Keisuke Sakamoto; Katsunori Ichiki

doi:10.1116/1.1494820

Generating high-efficiency neutral beams by using negative ions in an inductively coupled plasma source

Seiji Samukawa, Keisuke Sakamoto, Katsunori Ichiki

流体科学研究所・未到エネルギー研究センター

研究成果: Article › 査読

163 被引用数 (Scopus)

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A high-performance neutral-beam etching system, which minimizes radiation damage caused by charge buildup or ultraviolet and x-ray photons during etching, was discussed. It was found that the bottom carbon plate of the etching systems possessed numerous aperture for extraction of neutral beams from the plasma. The analysis showed that the neutralization efficiency of negative ions and maximum neutral flux density were 100% and 4.0 mA/cm² respectively.

本文言語	English
ページ（範囲）	1566-1573
ページ数	8
ジャーナル	Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films
巻	20
号	5
DOI	https://doi.org/10.1116/1.1494820
出版ステータス	Published - 2002 9月

ASJC Scopus subject areas

凝縮系物理学
表面および界面
表面、皮膜および薄膜

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10.1116/1.1494820

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Generating high-efficiency neutral beams by using negative ions in an inductively coupled plasma source

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