Generating high-efficiency neutral beams by using negative ions in an inductively coupled plasma source

Seiji Samukawa, Keisuke Sakamoto, Katsunori Ichiki

研究成果: Article

153 引用 (Scopus)

抜粋

A high-performance neutral-beam etching system, which minimizes radiation damage caused by charge buildup or ultraviolet and x-ray photons during etching, was discussed. It was found that the bottom carbon plate of the etching systems possessed numerous aperture for extraction of neutral beams from the plasma. The analysis showed that the neutralization efficiency of negative ions and maximum neutral flux density were 100% and 4.0 mA/cm2 respectively.

元の言語English
ページ(範囲)1566-1573
ページ数8
ジャーナルJournal of Vacuum Science and Technology A: Vacuum, Surfaces and Films
20
発行部数5
DOI
出版物ステータスPublished - 2002 9 1

ASJC Scopus subject areas

  • Condensed Matter Physics
  • Surfaces and Interfaces
  • Surfaces, Coatings and Films

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