F2 laser-induced damage on transparent fluoride crystals

Yoshizo Kawaguchi, Aiko Narazaki, Tadatake Sato, Ryozo Kurosaki, Hiroyuki Niino, Hiroki Sato, Tomohiko Satonaga, Tsuguo Fukuda

研究成果: Conference article査読

抄録

For the application of F2 lasers to micro- / nano-fabrication including photolithography, one of the important research subjects is to eliminate the chromatic aberration, and combination of lenses made of two optical materials with different refractive indices is the effective way. However, only CaF2 is widely applied to lenses for a vacuum ultraviolet (VUV) beam, and a "second material" to be paired with CaF2 is strongly requested. Here, we examined two fluoride crystals which are transparent in the VUV region, BaF2 and LiCaAIF6 grown by the Czochralski technique, as candidates for VUV optics. We investigated the change of the VUV transmittance and the onset of optical damage of these fluoride crystals against F2 laser irradiation. These crystals showed good optical tolerance against cumulative F2 laser irradiation, and the damage threshold of LiCaAIF6 was similar to mat of VUV grade CaF2 while that of BaF2 was about half of the other two fluoride crystals.

本文言語English
論文番号71
ページ(範囲)438-443
ページ数6
ジャーナルProceedings of SPIE - The International Society for Optical Engineering
5662
DOI
出版ステータスPublished - 2004
イベントFifth International Symposium on Laser Precision Microfabrication - Nara, Japan
継続期間: 2004 5 112004 5 14

ASJC Scopus subject areas

  • 電子材料、光学材料、および磁性材料
  • 凝縮系物理学
  • コンピュータ サイエンスの応用
  • 応用数学
  • 電子工学および電気工学

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