Formation of hexafluorosilicate on Si surface treated in NH4F investigated by photoemission and surface infrared spectroscopy

Michio Niwano, Kazunari Kurita, Yuki Takeda, Nobuo Miyamoto

研究成果: Article査読

11 被引用数 (Scopus)

抄録

The chemical nature of Si surfaces treated with ammonium fluoride (NH 4F) has been investigated using photoemission and surface infrared spectroscopy. On the surface after treatment in NH4F solution, there remain ammonium compounds such as NH4F and NH4F.HF. Photoemission data demonstrate that under the atmospheric environment, the ammonium compounds remaining on the NH4F-treated Si surface react with the Si substrate to generate the hexafluorosilicate salt, (NH 4)2SiF6. We propose that the formation of (NH4)2SiF6 or SiF62- ions is the dominant reaction pathway in the NH4F etching of Si crystals.

本文言語English
ページ(範囲)1003-1005
ページ数3
ジャーナルApplied Physics Letters
62
9
DOI
出版ステータスPublished - 1993
外部発表はい

ASJC Scopus subject areas

  • 物理学および天文学(その他)

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