Formation of an adsorbed monolayer from pentafluorophenyltriethoxysilane and its antisticking property to a UV-curable resin studied by high-sensitive UV-visible spectroscopy

Sosuke Korenaga, Kei Kobayashi, Akihiro Kohno, Shoichi Kubo, Masaru Nakagaw

研究成果: Article査読

抄録

Surface modification of a fused silica substrate was carried out by chemical vapor surface modification (CVSM) with (pentafluorophenyl) triethoxylsilane (F5Ph). The adsorption behavior of F5Ph was studied by high-sensitive UV-visible spectroscopy, contact angle measurement, and atomic force microscopy. The F5Ph adsorption on a silica substrate reached to the saturation by CVSM at 150 °C for 2 h. As a result, the adsorbed monolayer without aggregates was formed. The antisticking property of the F5Ph-adsorbed silica substrate to UV-curable resin causing radical photopolymerization was investigated. After curing and detaching a droplet of the resin, some organic components derived from the resin remained. The amount of remaining resin components on the F5Ph-adsorbed silica substrate was almost the same as that measured on silica substrates modified with (3,3,3-trifluoropropyl)trimethoxysilane (FAS3) and Optool-DSX forming antisticking layers. These results indicate that the F5Ph adsorbed monolayer is available as an antisticking layer in UV nanoimprint lithography. It was clear that high-sensitive UV-visible spectroscopy was a powerful tool to quantify adsorbed molecules on a silica mold surface and detect the adhesion of resin components after detachment.

本文言語English
ページ(範囲)59-64
ページ数6
ジャーナルJournal of Photopolymer Science and Technology
23
1
DOI
出版ステータスPublished - 2010

ASJC Scopus subject areas

  • Polymers and Plastics
  • Organic Chemistry
  • Materials Chemistry

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