Formation of Al-Cr-N coatings by dc reactive sputtering

Yukio Ide, Katsuhiko Kishitake, Takashi Nakamura

研究成果: Article査読

6 被引用数 (Scopus)

抄録

In this study, Al-Cr-N films were formed by a dc reactive sputtering process. The effect of the sputtering power and applied probe current on the emission density and ion current of reacting species in the plasma were determined by using optical emission spectroscope and a mass spectrometer. The formed films were characterized by X-ray diffraction, electron microscope analysis and auger electron spectroscopy.

本文言語English
ページ(範囲)1576-1583
ページ数8
ジャーナルNippon Kinzoku Gakkaishi/Journal of the Japan Institute of Metals
63
12
DOI
出版ステータスPublished - 1999
外部発表はい

ASJC Scopus subject areas

  • 凝縮系物理学
  • 材料力学
  • 金属および合金
  • 材料化学

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