Formation mechanisms for carbon onions and nanocapsules in C+-ion implanted copper

Hiroaki Abe, Shunya Yamamoto, Atsumi Miyashita, Kurt E. Sickafus

研究成果: Article査読

16 被引用数 (Scopus)

抄録

Copper substrates were implanted with carbon ions at temperature ranging from 570 to 973 K. Implantation microstructures were investigated using transmission electron microscopy and high-resolution electron microscopy. Carbon onions and nanocapsules were observed together with amorphous carbon layers. Most of the nanocapsules were found to be hollow and rarely included copper nanoparticles. The encapsulating of Cu nanoparticles with graphene layers, the gradual shrinkage of the encapsulated clusters, and finally the disappearance of the clusters (leaving behind hollow nanocapsules) were observed under electron irradiation at 783 K. Statistics of cluster size as a function of ion fluence, implantation temperature, and substrate crystallinity gave insights into the nucleation processes of onions and nanocapsules. One process involves the formation of graphene layers on grain boundaries to encapsulate copper particles. The other process is the nucleation of graphene cages, probably fullerenes, due to high concentration of carbon atoms and high amount of radiation damage.

本文言語English
ページ(範囲)3353-3358
ページ数6
ジャーナルJournal of Applied Physics
90
7
DOI
出版ステータスPublished - 2001 10月 1

ASJC Scopus subject areas

  • 物理学および天文学(全般)

フィンガープリント

「Formation mechanisms for carbon onions and nanocapsules in C+-ion implanted copper」の研究トピックを掘り下げます。これらがまとまってユニークなフィンガープリントを構成します。

引用スタイル