Fluorinated amorphous carbon thin films grown by plasma enhanced chemical vapor deposition for low dielectric constant interlayer dielectrics

Chemistry

• Methane 100%
• Dielectric Constant 83%
• Dielectric Material 33%
• Liquid Film 16%
• Rate 16%
• Reactor 16%
• Flow Kinetics 16%

Material Science

• Amorphous Carbon 66%
• Carbon Films 50%
• Dielectric Material 33%
• Thin Films 16%
• Liquid Films 16%

Physics

• Dielectrics 33%
• Thin Films 16%
• Flow Velocity 16%
• Parallel Plate 16%
• Circuits 16%
• Deposition 16%