Fine particle removal by a negatively-charged fine particle collector in silane plasma

Yuji Kurimoto, Naoki Matsuda, Giichiro Uchida, Satoru Iizuka, Maki Suemitsu, Noriyoshi Sato

研究成果: Article

18 引用 (Scopus)

抜粋

To suppress inclusion of fine particles in amorphous silicon films, a negatively-charged fine particle (NFP) collector has been successfully installed in a silane plasma. Two modes of operation of the NFP collector biasing were examined: (i) turning on after the appearance of fine particles; and (ii) turning on from the very beginning of the plasma operation. While the former proved the effectiveness of the NFP collector in the removal of fine particles, apparently very small particles (<100 nm) removal in the latter reduced the degradation of the photo conductivity in deposited a-Si:H films by light soaking. This effect is accompanied by the increased density of Si-H bonding, which can be related to the possible modification in the silicon networks in the amorphous film.

元の言語English
ページ(範囲)285-291
ページ数7
ジャーナルThin Solid Films
457
発行部数2
DOI
出版物ステータスPublished - 2004 6 15

ASJC Scopus subject areas

  • Electronic, Optical and Magnetic Materials
  • Surfaces and Interfaces
  • Surfaces, Coatings and Films
  • Metals and Alloys
  • Materials Chemistry

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  • これを引用

    Kurimoto, Y., Matsuda, N., Uchida, G., Iizuka, S., Suemitsu, M., & Sato, N. (2004). Fine particle removal by a negatively-charged fine particle collector in silane plasma. Thin Solid Films, 457(2), 285-291. https://doi.org/10.1016/j.tsf.2003.11.300