Fast atom beam-based fabrication of high-efficienct blazed grating using slanting angle control of a substrate

Cha Bum Lee, Kazuhiro Hane, Sun Kyu Lee

研究成果: Conference contribution

抄録

This paper presents electromagnetic analysis of Si-based small period blazed reflection gratings for a period of 0.6 - 1.5 μm in terms of the rigorous coupled wave analysis (RCWA) and its fabrication using fast atom beam (FAB) etching method. The optimized blazed gratings were successfully fabricated on a slanted silicon substrate by FAB etching method, and diffraction efficiencies (DE) for four kinds of gratings were evaluated from optical testing and these results showed good agreement with these theoretical values, respectively.

本文言語English
ホスト出版物のタイトル2010 International Conference on Optical MEMS and Nanophotonics, Optical MEMS and Nanophotonics 2010
ページ149-150
ページ数2
DOI
出版ステータスPublished - 2010 12 1
イベント2010 International Conference on Optical MEMS and Nanophotonics, Optical MEMS and Nanophotonics 2010 - Sapporo, Japan
継続期間: 2010 8 92010 8 12

出版物シリーズ

名前2010 International Conference on Optical MEMS and Nanophotonics, Optical MEMS and Nanophotonics 2010

Other

Other2010 International Conference on Optical MEMS and Nanophotonics, Optical MEMS and Nanophotonics 2010
国/地域Japan
CitySapporo
Period10/8/910/8/12

ASJC Scopus subject areas

  • 制御およびシステム工学
  • 電子工学および電気工学

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