Fabrication sub-micron gratings based on embossing

Yigui Li, Chun Hui, Jun Zhu, Jingquan Liu, Y. Kanamori

研究成果: Conference contribution

抄録

We demonstrated two kinds of sub-micron gratings fabricated by embossing method from anisotropically etched silicon molds. One kind of grating is a line grating with a pitch of 500 nm; the other kind is grating array with a pitch of 200 nm. We investigated the feasibility of the fabrication method for the micro fabrication of the high aspect ratio silicon molds: that is for fabricating molds by using electron beam lithography plus fast atom beam (FAB) etching. The replication yield, repeatability and efficiency from the original master are good. This technique can also be used to fabricate other sub-micron scale structures.

本文言語English
ホスト出版物のタイトルDTIP 2003 - Design, Test, Integration and Packaging of MEMS/MOEMS 2003
編集者Bernard Courtois, Jean Michel Karam, Jan Korvink, Karen Markus, Keren Bergman, Bernd Michel
出版社Institute of Electrical and Electronics Engineers Inc.
ページ350-352
ページ数3
ISBN(電子版)078037066X, 9780780370661
DOI
出版ステータスPublished - 2003
イベント5th Symposium on Design, Test, Integration and Packaging of MEMS/MOEMS 2003, DTIP 2003 - Cannes, France
継続期間: 2003 5月 52003 5月 7

出版物シリーズ

名前DTIP 2003 - Design, Test, Integration and Packaging of MEMS/MOEMS 2003

Other

Other5th Symposium on Design, Test, Integration and Packaging of MEMS/MOEMS 2003, DTIP 2003
国/地域France
CityCannes
Period03/5/503/5/7

ASJC Scopus subject areas

  • 産業および生産工学
  • 電子材料、光学材料、および磁性材料
  • 電子工学および電気工学

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