Fabrication of three-dimensional microstructure using maskless gray-scale lithography

Kentaro Totsu, Kenta Fujishiro, Shuji Tanaka, Masayoshi Esashi

研究成果: Article査読

141 被引用数 (Scopus)

抄録

A fabrication process of precisely controlled three-dimensional (3D) microstructures using a maskless gray-scale lithography is described. Multilayered ultraviolet (UV) exposure patterns digitally generated by a commercialized maskless exposure system are superposed on a photoresist-coated substrate layer by layer so as to realize a 3D profile of the UV dose. After a development with an appropriate time, 3D profile of photoresist corresponding to the profile of the UV dose is obtained. Changing the exposure patterns and the exposure time of each exposure makes the precise control of the profile of UV dose possible. The maskless exposure system realizes fabrication of variable three-dimensional patterns at low cost with saving time. As the result of the maskless gray-scale lithography, positive photoresist patterns of spherical and aspherical microlens array of 100 μm in each diameter and 17 μm in height are fabricated. The patterns are transferred into silicon substrates with reactive ion etching (RIE).

本文言語English
ページ(範囲)387-392
ページ数6
ジャーナルSensors and Actuators, A: Physical
130-131
SPEC. ISS.
DOI
出版ステータスPublished - 2006 8月 14

ASJC Scopus subject areas

  • 電子材料、光学材料、および磁性材料
  • 器械工学
  • 凝縮系物理学
  • 表面、皮膜および薄膜
  • 金属および合金
  • 電子工学および電気工学

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