Fabrication of spin-frustrated Sm2Mo2O7 epitaxial films: High throughput optimization using a temperature gradient method

J. Nishimura; T. Fukumura; M. Ohtani; Y. Taguchi; M. Kawasaki; I. Ohkubo; H. Koinuma; H. Ohguchi; K. Ono; Oshima; Y. Tokura

doi:10.1063/1.1559440

Fabrication of spin-frustrated Sm₂Mo₂O₇ epitaxial films: High throughput optimization using a temperature gradient method

J. Nishimura, T. Fukumura, M. Ohtani, Y. Taguchi, M. Kawasaki, I. Ohkubo, H. Koinuma, H. Ohguchi, K. Ono, Oshima, Y. Tokura

研究成果: Article › 査読

11 被引用数 (Scopus)

抄録

The epitaxial thin films of spin-frustrated Sm₂Mo₂O₇ were fabricated by a pulsed-laser deposition. The X-ray diffraction method and the temperature gradient method were combined for high throughput optimization of the film quality. It was observed that the excess supply of molybdenum which compensates the volatile molybdenum related species improves the crystallinity.

本文言語	English
ページ（範囲）	1571-1573
ページ数	3
ジャーナル	Applied Physics Letters
巻	82
号	10
DOI	https://doi.org/10.1063/1.1559440
出版ステータス	Published - 2003 3月 10

ASJC Scopus subject areas

物理学および天文学（その他）

文献へのアクセス

10.1063/1.1559440

他のファイルとリンク

引用スタイル

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AU - Oshima,

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