Fabrication of porous polyimide nanoparticles and their multilayered film

Gufan Zhao; Takayuki Ishizaka; Hitoshi Kasai; Hachiro Nakanishi

Fabrication of porous polyimide nanoparticles and their multilayered film

Gufan Zhao, Takayuki Ishizaka, Hitoshi Kasai, Hachiro Nakanishi

多元物質科学研究所・高分子・ハイブリッド材料研究センター

研究成果: Paper › 査読

抄録

Recently, porous polyimide (PI) nanoparticles have been successfully fabricated by reprecipitation method. After reprecipitation process, porous poly(amic acid) (PAA, precursor of PI) nanoparticles were obtained by using PAA solution adding other polymers as a source of pores. Then porous PI nanoparticles were fabricated by the two-step imidization of porous PAA nanoparticles without morphology transformation. Furthermore, multilayered films assembled by porous PI nanoparticles obtained were also successfully fabricated by electrodeposition method. It provides a new route to interlayer insulation films with lower dielectric constant for the prospective microelectronic applications.

本文言語	English
ページ数	1
出版ステータス	Published - 2005 12 1
イベント	54th SPSJ Annual Meeting 2005 - Yokohama, Japan 継続期間: 2005 5 25 → 2005 5 27

Other

Other	54th SPSJ Annual Meeting 2005
Country	Japan
City	Yokohama
Period	05/5/25 → 05/5/27

ASJC Scopus subject areas

Engineering(all)

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引用スタイル

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abstract = "Recently, porous polyimide (PI) nanoparticles have been successfully fabricated by reprecipitation method. After reprecipitation process, porous poly(amic acid) (PAA, precursor of PI) nanoparticles were obtained by using PAA solution adding other polymers as a source of pores. Then porous PI nanoparticles were fabricated by the two-step imidization of porous PAA nanoparticles without morphology transformation. Furthermore, multilayered films assembled by porous PI nanoparticles obtained were also successfully fabricated by electrodeposition method. It provides a new route to interlayer insulation films with lower dielectric constant for the prospective microelectronic applications.",

keywords = "Electrodeposition, Laminated film, Polyimide, Porous nanoparticle, Reprecipitation method, Template method",

author = "Gufan Zhao and Takayuki Ishizaka and Hitoshi Kasai and Hachiro Nakanishi",

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T1 - Fabrication of porous polyimide nanoparticles and their multilayered film

AU - Zhao, Gufan

AU - Ishizaka, Takayuki

AU - Kasai, Hitoshi

AU - Nakanishi, Hachiro

PY - 2005/12/1

Y1 - 2005/12/1

N2 - Recently, porous polyimide (PI) nanoparticles have been successfully fabricated by reprecipitation method. After reprecipitation process, porous poly(amic acid) (PAA, precursor of PI) nanoparticles were obtained by using PAA solution adding other polymers as a source of pores. Then porous PI nanoparticles were fabricated by the two-step imidization of porous PAA nanoparticles without morphology transformation. Furthermore, multilayered films assembled by porous PI nanoparticles obtained were also successfully fabricated by electrodeposition method. It provides a new route to interlayer insulation films with lower dielectric constant for the prospective microelectronic applications.

AB - Recently, porous polyimide (PI) nanoparticles have been successfully fabricated by reprecipitation method. After reprecipitation process, porous poly(amic acid) (PAA, precursor of PI) nanoparticles were obtained by using PAA solution adding other polymers as a source of pores. Then porous PI nanoparticles were fabricated by the two-step imidization of porous PAA nanoparticles without morphology transformation. Furthermore, multilayered films assembled by porous PI nanoparticles obtained were also successfully fabricated by electrodeposition method. It provides a new route to interlayer insulation films with lower dielectric constant for the prospective microelectronic applications.

KW - Electrodeposition

KW - Laminated film

KW - Polyimide

KW - Porous nanoparticle

KW - Reprecipitation method

KW - Template method

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T2 - 54th SPSJ Annual Meeting 2005

Y2 - 25 May 2005 through 27 May 2005

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