Fabrication of novel structures on silicon with femtosecond laser pulses

W. C. Shen, C. W. Cheng, M. C. Yang, Y. Kozawa, S. Sato

研究成果: Article査読

11 被引用数 (Scopus)

抄録

In this study, the fabrication of novel micro/nano structures were induced on silicon surfaces us-ing radially and azimuthally polarized femtosecond laser, with a ~120 fs pulse duration, an 800 nm wavelength, and a 1 kHz repetition rate. Results showed that, as the laser fluence approached the ab-lation threshold of the silicon, nanostructures with a period of approximately 600~700 nm were formed at the low laser fluence region (0.7~0.8 J/cm2), and their orientations were perpendicular to the laser polarization. However, as the laser fluence increased (0.9~1.1 J/cm2), microstructures with a period of approximately 2~3 μm were formed, and their orientation were parallel to the laser polarization.

本文言語English
ページ(範囲)229-232
ページ数4
ジャーナルJournal of Laser Micro Nanoengineering
5
3
DOI
出版ステータスPublished - 2010 12月

ASJC Scopus subject areas

  • 器械工学
  • 産業および生産工学
  • 電子工学および電気工学

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