Fabrication of Nanopit Arrays on Si(111)

Won Chul Moon, Tatsuo Yoshinobu, Hiroshi Iwasaki

研究成果: Conference article査読

12 被引用数 (Scopus)

抄録

The fabrication of nanopit arrays on n-type Si(111) substrates by anodic oxidation with atomic force microscope (AFM) followed by chemical etching is presented. Possible applications for nanopit arrays include controlled nucleation sites in crystal growth and metal embedding for quantum devices. In this study, we investigate the anodic oxidation and chemical etching processes in order to optimize the conditions for the fabrication of dots and pits of the desired shape and size. The dependence of the process on bias voltage, pulse length, and humidity is reported.

本文言語English
ページ(範囲)483-486
ページ数4
ジャーナルJapanese Journal of Applied Physics, Part 1: Regular Papers and Short Notes and Review Papers
38
1 B
DOI
出版ステータスPublished - 1999
外部発表はい
イベントProceedings of the 1998 International Symposium on Formation, Physics and Device Application of Quantum Dot Structures, QDS-98 - Sapporo, Japan
継続期間: 1998 5 311998 6 4

ASJC Scopus subject areas

  • 工学(全般)
  • 物理学および天文学(全般)

フィンガープリント

「Fabrication of Nanopit Arrays on Si(111)」の研究トピックを掘り下げます。これらがまとまってユニークなフィンガープリントを構成します。

引用スタイル