Electromigration (EM) is the phenomenon of atomic diffusion in a metallic film with a high-density electron flow. Our group used EM to fabricate Al micro-materials. The EM technique can be used to fabricate micro-materials with a high aspect ratio, pure metal components, an arbitrary form, and a single-crystal structure. Recently, two micro-materials have been simultaneously fabricated using an array pattern consisting of parallel or series connections. However, multiple micro-materials have not been fabricated simultaneously thus far. In this study, a new comb sample pattern was used with a conductive passivation film to produce multiple Al micro-materials.