Fabrication of L10-FePt thin films by using conventional thermal annealing and indirect rapid thermal annealing is studied. By using conventional thermal annealing, L10-FePt thin films are fabricated over 500°C. By using the rapid thermal annealing, it was found that the formation temperature of L10-FePt thin films decreases effectively. In addition, this method enables to prevent the grain growth due to annealing.
ASJC Scopus subject areas
- Electronic, Optical and Magnetic Materials
- Electrical and Electronic Engineering