Fabrication of L10-FePt thin films by rapid thermal annealing

K. Aimuta, K. Nishimura, S. Hashi, M. Inoue

研究成果: Article査読

8 被引用数 (Scopus)

抄録

Fabrication of L10-FePt thin films by using conventional thermal annealing and indirect rapid thermal annealing is studied. By using conventional thermal annealing, L10-FePt thin films are fabricated over 500°C. By using the rapid thermal annealing, it was found that the formation temperature of L10-FePt thin films decreases effectively. In addition, this method enables to prevent the grain growth due to annealing.

本文言語English
ページ(範囲)3898-3900
ページ数3
ジャーナルIEEE Transactions on Magnetics
41
10
DOI
出版ステータスPublished - 2005 10 1
外部発表はい

ASJC Scopus subject areas

  • Electronic, Optical and Magnetic Materials
  • Electrical and Electronic Engineering

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