Fabrication of highly conductive Ti1-x Nbx O2 polycrystalline films on glass substrates via crystallization of amorphous phase grown by pulsed laser deposition

T. Hitosugi, A. Ueda, S. Nakao, N. Yamada, Y. Furubayashi, Y. Hirose, T. Shimada, T. Hasegawa

    研究成果: Article査読

    135 被引用数 (Scopus)

    抄録

    Nb-doped anatase Ti O2 [Ti0.94 Nb0.06 O2 (TNO)] films with high electrical conductivity and transparency were fabricated on nonalkali glass using pulsed laser deposition and subsequent annealing in a H2 atmosphere. The amorphous films as deposited on unheated substrates were found to crystallize, forming polycrystalline films at around 350 °C. The films annealed at 500 °C showed resistivity down to 4.6× 10-4 cm at room temperature and optical transmittance of 60%-80% in the visible region, which are comparable to those of epitaxial films. These results indicate that TNO films have the potential to be practical transparent conducting oxides that could replace indium tin oxide.

    本文言語English
    論文番号212106
    ジャーナルApplied Physics Letters
    90
    21
    DOI
    出版ステータスPublished - 2007

    ASJC Scopus subject areas

    • 物理学および天文学(その他)

    フィンガープリント

    「Fabrication of highly conductive Ti1-x Nbx O2 polycrystalline films on glass substrates via crystallization of amorphous phase grown by pulsed laser deposition」の研究トピックを掘り下げます。これらがまとまってユニークなフィンガープリントを構成します。

    引用スタイル