Periodical structures in the nanometer order, which are clearer and of superior aspect than those reported elsewhere, were fabricated. These structures were fabricated onto a positive-type photoresist film by a two-beam interference technique using a single-pulse Nd:YAG (355 nm) laser. A grating structure with a depth of more than 300 nm and period of 400 nm was formed, accompanied by wet development. Moreover, a 200-nm-period grating, which is close to the theoretical limit, was successfully fabricated with higher aspect.
|ジャーナル||Japanese Journal of Applied Physics, Part 1: Regular Papers and Short Notes and Review Papers|
|出版ステータス||Published - 2004 4|
ASJC Scopus subject areas
- Physics and Astronomy(all)