High resolution gratings for the application of optical waveguide devices are fabricated using a series of photopolymers. The relief gratings were formed by the two-beam interference ablation technique using a third-harmonic generation of a Nd:YAG laser (355nm) onto polyimide and electrooptic polymer films. In polyimide films, the gratings with a period of 400nm and a depth of about 280nm were fabricated by the single-pulse irradiation. We tried to fabricate the gratings using a photoresist accompanied with wet development using an Ar+ laser (488nm). By wet development process, higher aspect and clearer periodical structure at a depth of 320nm and a period of nearly 500nm was realized. High diffraction efficiency of 55.4% was measured from the relief grating. We also replicated the grating to UV curable epoxy resin as an embossing master for the fabrication of waveguide devices.
|ジャーナル||Proceedings of SPIE - The International Society for Optical Engineering|
|出版ステータス||Published - 2004 8 16|
|イベント||Organic Photonic Materials and Devices VI - San Jose, CA, United States|
継続期間: 2004 1 27 → 2004 1 29
ASJC Scopus subject areas
- コンピュータ サイエンスの応用