Fabrication of high resolution gratings for polymeric optical waveguide devices

Shinya Shibata, Okihiro Sugihara, Toshikuni Kaino, Naomichi Okamoto

研究成果: Conference article査読

2 被引用数 (Scopus)

抄録

High resolution gratings for the application of optical waveguide devices are fabricated using a series of photopolymers. The relief gratings were formed by the two-beam interference ablation technique using a third-harmonic generation of a Nd:YAG laser (355nm) onto polyimide and electrooptic polymer films. In polyimide films, the gratings with a period of 400nm and a depth of about 280nm were fabricated by the single-pulse irradiation. We tried to fabricate the gratings using a photoresist accompanied with wet development using an Ar+ laser (488nm). By wet development process, higher aspect and clearer periodical structure at a depth of 320nm and a period of nearly 500nm was realized. High diffraction efficiency of 55.4% was measured from the relief grating. We also replicated the grating to UV curable epoxy resin as an embossing master for the fabrication of waveguide devices.

本文言語English
ページ(範囲)127-133
ページ数7
ジャーナルProceedings of SPIE - The International Society for Optical Engineering
5351
DOI
出版ステータスPublished - 2004 8 16
イベントOrganic Photonic Materials and Devices VI - San Jose, CA, United States
継続期間: 2004 1 272004 1 29

ASJC Scopus subject areas

  • 電子材料、光学材料、および磁性材料
  • 凝縮系物理学
  • コンピュータ サイエンスの応用
  • 応用数学
  • 電子工学および電気工学

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