Fabrication of diamond mold for imprint lithography

C. Konoma, T. Ono, H. Miyashita, Y. Kanomori, M. Esashi

研究成果: Conference contribution

抄録

The authors propose the fabrication method for a diamond mold for imprint lithography to transfer the dot pattern onto recording media. It is expected that more high density and small dot patterns will be imprinted using the diamond mold. A diamond thin film with a thickness of about 10 μm was deposited on a Si wafer using hot-filament chemical vapor deposition (HF-CVD). The wafer with the diamond film was anodically bonded with 5 mm thick Pyrex glass via sputtered Al film as an adhesive layer. An aligned hole pattern can be successfully transferred on the diamond film by oxygen fast atom beam etching.

本文言語English
ホスト出版物のタイトル2002 International Microprocesses and Nanotechnology Conference, MNC 2002
出版社Institute of Electrical and Electronics Engineers Inc.
ページ164-165
ページ数2
ISBN(電子版)4891140313, 9784891140311
DOI
出版ステータスPublished - 2002 1 1
イベントInternational Microprocesses and Nanotechnology Conference, MNC 2002 - Tokyo, Japan
継続期間: 2002 11 62002 11 8

出版物シリーズ

名前2002 International Microprocesses and Nanotechnology Conference, MNC 2002

Other

OtherInternational Microprocesses and Nanotechnology Conference, MNC 2002
CountryJapan
CityTokyo
Period02/11/602/11/8

ASJC Scopus subject areas

  • Hardware and Architecture
  • Electrical and Electronic Engineering

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