Fabrication and characterization of nanoscale resonant gratings on thin silicon membrane

Yongjin Wang, Yoshiaki Kanamori, Jiasheng Ye, Hidehisa Sameshima, Kazuhiro Hane

研究成果: Article査読

25 被引用数 (Scopus)

抄録

We report the design and fabrication of nanoscale resonant gratings which is of interest for narrow bandwidth filtering application. The linear/circular grating structures, of which the grating width is 200nm and the grating height is 260nm, are generated on silicon-on-insulator wafer. Nanoscale gratings are fabricated on the silicon device layer by a combination of electron beam lithography and fast atom beam etching. The silicon handle layer under grating region is removed by deep reactive ion etching, and the buried oxide layer is kept. The reflectance measurements are performed to characterize the optical response of fabricated freestanding nanoscale gratings. The resonant behavior of linear gratings agrees with the theoretical predication, and the polarization-independent responses of circular gratings are also experimentally demonstrated.

本文言語English
ページ(範囲)4938-4943
ページ数6
ジャーナルOptics Express
17
7
DOI
出版ステータスPublished - 2009 3 30

ASJC Scopus subject areas

  • 原子分子物理学および光学

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