LaNi5 films were deposited on a nickel substrate using a La2Ni7 alloy target with a sputtering power, Ws, of 50-400 W at substrate temperature, Ts, of 323-573 K by a radio frequency magnetron sputtering apparatus. The nickel content of the films decreased with increasing Ws and increased with increasing Ts. At low Ws and low Ts, amorphous films were deposited. In other conditions, the films were polycrystalline. The films deposited at high Ws and low Ts exhibited only a (hk · 0) peak in the X-ray diffraction profiles. This indicates that the c-axis of crystalline films was oriented parallel to the substrate plane. At high Ws and high Ts, the films with columnar structure were obtained. The hydrogen absorption capacity of the films increased with increasing Ws. On the other hand, the equilibrium pressure of the films decreased with increasing Ws. The films deposited at 400 W represented a pressure plateau on the pressure-composition isotherms.
|ジャーナル||Zeitschrift fuer Metallkunde/Materials Research and Advanced Techniques|
|出版ステータス||Published - 2001 10 1|
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