Fabrication and characterization of hydrogen absorption LaNi5 alloy films sputtered on nickel substrate

M. Ohtsuka, Y. Takeda, T. Kobayashi, K. Itagaki

研究成果: Article査読

抄録

LaNi5 films were deposited on a nickel substrate using a La2Ni7 alloy target with a sputtering power, Ws, of 50-400 W at substrate temperature, Ts, of 323-573 K by a radio frequency magnetron sputtering apparatus. The nickel content of the films decreased with increasing Ws and increased with increasing Ts. At low Ws and low Ts, amorphous films were deposited. In other conditions, the films were polycrystalline. The films deposited at high Ws and low Ts exhibited only a (hk · 0) peak in the X-ray diffraction profiles. This indicates that the c-axis of crystalline films was oriented parallel to the substrate plane. At high Ws and high Ts, the films with columnar structure were obtained. The hydrogen absorption capacity of the films increased with increasing Ws. On the other hand, the equilibrium pressure of the films decreased with increasing Ws. The films deposited at 400 W represented a pressure plateau on the pressure-composition isotherms.

本文言語English
ページ(範囲)1134-1138
ページ数5
ジャーナルZeitschrift fuer Metallkunde/Materials Research and Advanced Techniques
92
10
出版ステータスPublished - 2001 10 1

ASJC Scopus subject areas

  • 凝縮系物理学
  • 物理化学および理論化学
  • 金属および合金
  • 材料化学

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