We have developed a novel X-ray multilayer working as a focusing polychromator. A multilayer mirror enables independent designs of the focal length and the spectral dispersion, and much higher throughput than the curved crystal. Our ion beam sputtering deposition apparatus has a speed programmable shuttering system for control of the lateral thickness gradient. A SiC/C and three V/C multilayers were deposited on each 150 mm long Si wafers. Period thicknesses are tuned to the designed energy of 5-12 keV, 12-19 keV, 19-26 keV and 26-33 keV, respectively. Four multilayers were clamped to form a 600 mm long 5-33 keV range elliptic mirror on a shaped Cu base plate. The focal length is 700 mm, which is large enough for setups around the sample position. The energy calibration was performed at BL-15C of the Photon Factory based on absorption edges of metal foils, which was in good agreement with the period thickness measured by a laboratory X-ray diffractometer.