Fabrication and characterization of elliptically-curved, laterally-graded multilayers for focusing X-ray polychromator applications

Tadashi Hatano, Tetsuo Harada, Tadashi Matsushita, Etsuo Arakawa, Yasuo Higashi

    研究成果: Conference contribution

    2 被引用数 (Scopus)

    抄録

    We have developed a novel X-ray multilayer working as a focusing polychromator. A multilayer mirror enables independent designs of the focal length and the spectral dispersion, and much higher throughput than the curved crystal. Our ion beam sputtering deposition apparatus has a speed programmable shuttering system for control of the lateral thickness gradient. A SiC/C and three V/C multilayers were deposited on each 150 mm long Si wafers. Period thicknesses are tuned to the designed energy of 5-12 keV, 12-19 keV, 19-26 keV and 26-33 keV, respectively. Four multilayers were clamped to form a 600 mm long 5-33 keV range elliptic mirror on a shaped Cu base plate. The focal length is 700 mm, which is large enough for setups around the sample position. The energy calibration was performed at BL-15C of the Photon Factory based on absorption edges of metal foils, which was in good agreement with the period thickness measured by a laboratory X-ray diffractometer.

    本文言語English
    ホスト出版物のタイトルSRI 2009 - The 10th International Conference on Synchrotron Radiation Instrumentation
    ページ669-672
    ページ数4
    DOI
    出版ステータスPublished - 2010 8 3
    イベント10th International Conference on Synchrotron Radiation Instrumentation, SRI 2009 - Melbourne, VIC, Australia
    継続期間: 2009 9 272009 10 2

    出版物シリーズ

    名前AIP Conference Proceedings
    1234
    ISSN(印刷版)0094-243X
    ISSN(電子版)1551-7616

    Other

    Other10th International Conference on Synchrotron Radiation Instrumentation, SRI 2009
    CountryAustralia
    CityMelbourne, VIC
    Period09/9/2709/10/2

    ASJC Scopus subject areas

    • Physics and Astronomy(all)

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