Fabrication and Basic Characteristics of Dry-Etched Micro Inductors

M. Yamaguchi, M. Matsumoto, H. Ohzeki, K. I. Arai

研究成果: Article査読

24 被引用数 (Scopus)

抄録

Thin film meander inductors having 10-6m range coil spacing were fabricated successfully. The inductance measured with microstrip line increased with increasing the coil spacing due to the dielectric coupling between the meander lines. Maximum value of the applicable current density is examined and it is clarified that the magnetic thin films are requested to provide high saturation magnetization in order to remain in the under saturated region in case of high current density applications. These results give a basis for developing thin film micro inductors and transformers.

本文言語English
ページ(範囲)2014-2016
ページ数3
ジャーナルIEEE Transactions on Magnetics
26
5
DOI
出版ステータスPublished - 1990 9

ASJC Scopus subject areas

  • Electronic, Optical and Magnetic Materials
  • Electrical and Electronic Engineering

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