Evaluation of the change of the residual stress in nano-scale transistors during the deposition and fine patterning processes of thin films

Kota Nakahira, Hironori Tago, Hiroki Kishi, Ken Suzuki, Hideo Miura, Masaki Yoshimaru, Ken Ichiro Tatsuuma

研究成果: Conference contribution

フィンガープリント Evaluation of the change of the residual stress in nano-scale transistors during the deposition and fine patterning processes of thin films' の研究トピックを掘り下げます。これらはともに一意のフィンガープリントを構成します。

Mathematics

Engineering & Materials Science