Evaluation of the change of the residual stress in nano-scale transistors during the deposition and fine patterning processes of thin films

Kota Nakahira, Hironori Tago, Hiroki Kishi, Ken Suzuki, Hideo Miura, Masaki Yoshimaru, Ken Ichiro Tatsuuma

研究成果: Conference contribution

抜粋

The embedded strain gauges in a PQC-TEG were applied to the measurement of the change of the residual stress in a transistor structure with a 50-nm wide gate during thin film processing. The change of the residual stress was successfully monitored through the process such as the deposition and etching of thin films. In addition, the fluctuation of the process such as the intrinsic stress of thin films and the height and the width of the etched structures was also detected by the statistical analysis of the measured data. The sensitivity of the measurement was 1 MPa and it was validated that the amplitude of the fluctuation exceeded 100 MPa. This technique is also effective for detecting the spatial distribution of the stress in a wafer and its fluctuation among wafers.

元の言語English
ホスト出版物のタイトル2011 12th Int. Conf. on Thermal, Mechanical and Multi-Physics Simulation and Experiments in Microelectronics and Microsystems, EuroSimE 2011
DOI
出版物ステータスPublished - 2011 6 7
イベント2011 12th Int. Conf. on Thermal, Mechanical and Multi-Physics Simulation and Experiments in Microelectronics and Microsystems, EuroSimE 2011 - Linz, Austria
継続期間: 2011 4 182011 4 20

出版物シリーズ

名前2011 12th Int. Conf. on Thermal, Mechanical and Multi-Physics Simulation and Experiments in Microelectronics and Microsystems, EuroSimE 2011

Other

Other2011 12th Int. Conf. on Thermal, Mechanical and Multi-Physics Simulation and Experiments in Microelectronics and Microsystems, EuroSimE 2011
Austria
Linz
期間11/4/1811/4/20

ASJC Scopus subject areas

  • Electrical and Electronic Engineering
  • Modelling and Simulation

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  • これを引用

    Nakahira, K., Tago, H., Kishi, H., Suzuki, K., Miura, H., Yoshimaru, M., & Tatsuuma, K. I. (2011). Evaluation of the change of the residual stress in nano-scale transistors during the deposition and fine patterning processes of thin films. : 2011 12th Int. Conf. on Thermal, Mechanical and Multi-Physics Simulation and Experiments in Microelectronics and Microsystems, EuroSimE 2011 [5765760] (2011 12th Int. Conf. on Thermal, Mechanical and Multi-Physics Simulation and Experiments in Microelectronics and Microsystems, EuroSimE 2011). https://doi.org/10.1109/ESIME.2011.5765760