Evaluation and application of resist for alkaline wet etching

Tomokazu Takahashi, Mitsutoshi Makihata, Masayoshi Esashi, Shuji Tanaka

研究成果: Article査読

11 被引用数 (Scopus)

抄録

ProTEK PSB and ProTEK B3 (Brewer Science, Inc.) are negative type photosensitive resist and non-photosensitive resist for alkaline wet etching, respectively. This paper mainly reports the patterning characteristics, etch resistance and removal characteristics of ProTEK PSB under practical conditions for a real application. Our study found two problems of ProTEK PSB: unacceptably-large side-etching and difficulty in removing the primer by organic solvents or O2 ashing. For the fabrication of a LSI-integrated tactile sensor, we used ProTEK PSB with a low temperature oxide underlayer. This combination solves both side etching problem for ProTEK PSB and pinhole problem for low temperature oxide, providing the practical alkaline etching mask which can be prepared at low temperature.

本文言語English
ページ(範囲)421-425
ページ数5
ジャーナルIEEJ Transactions on Sensors and Micromachines
130
9
DOI
出版ステータスPublished - 2010

ASJC Scopus subject areas

  • 機械工学
  • 電子工学および電気工学

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