抄録
Zinc-blende CrAs/GaAs multilayers were grown by molecular beam epitaxy. It was certified that each CrAs layer maintains an epitaxial relationship with the zinc-blende GaAs structure judging from the reflection high-energy electron diffraction observation. The film contains thicker zinc- blende CrAs layers in total than the CrAs thin film directly grown on the GaAs substrate which has the critical thickness of 3 nm. It was clarified that the optimum thicknesses of CrAs and GaAs to keep a good epitaxial relationship are 2 ML and 2 ML, respectively. The electronic structure of the multilayer is thought to be close to that of the (Ga, Cr)As thin film which has 50% of Cr content judging from x-ray absorption spectroscopy measurements.
本文言語 | English |
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ページ(範囲) | 7917-7919 |
ページ数 | 3 |
ジャーナル | Journal of Applied Physics |
巻 | 91 |
号 | 10 I |
DOI | |
出版ステータス | Published - 2002 5月 15 |
外部発表 | はい |
ASJC Scopus subject areas
- 物理学および天文学(全般)