Epitaxial growth of C60 thin films using continuous-wave laser molecular beam epitaxy

Seiichiro Yaginuma, Kenji Itaka, Masamitsu Haemori, Masao Katayama, Yuji Matsumoto, Hideomi Koinuma

研究成果: Conference contribution

抄録

We have fabricated C60 thin films on various substrates (mica, MoS2, HOPG, LiF, NaCl, KBr, KCl and CaF2) by using continuous-wave laser molecular beam epitaxy (CWL-MBE), which is very suitable technique to grow epitaxial organic thin films because of good controllability of evaporation as compared with Knudsen-cell method. The films were evaluated by reflection high-energy electron diffraction with micro channel imaging plate (MCP-RHEED) and atomic force microscopy (AFM). AFM images of the C60 films on mica, MoS2 and HOPG substrates show flat and homogeneous, morphology, and epitaxial growth of the films on mica and MoS2 substrates were observed by RHEED. This result shows mica, MoS2, HOPG substrates are good candidates for epitaxial growth of C60 thin films.

本文言語English
ホスト出版物のタイトルOrganic Electronics
ホスト出版物のサブタイトルMaterials, Devices and Applications
ページ223-227
ページ数5
出版ステータスPublished - 2006 12月 1
外部発表はい
イベント2006 MRS Fall Meeting - Boston, MA, United States
継続期間: 2006 11月 272006 11月 29

出版物シリーズ

名前Materials Research Society Symposium Proceedings
965
ISSN(印刷版)0272-9172

Other

Other2006 MRS Fall Meeting
国/地域United States
CityBoston, MA
Period06/11/2706/11/29

ASJC Scopus subject areas

  • 材料科学(全般)
  • 凝縮系物理学
  • 材料力学
  • 機械工学

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