Enhanced durability of antisticking layers by recoating a silica surface with fluorinated alkylsilane derivatives by chemical vapor surface modification

Akihiro Kohno, Nobuji Sakai, Shinji Matsui, Masaru Nakagawa

    研究成果: Article査読

    15 被引用数 (Scopus)

    抄録

    Adsorbed monolayers from (3,3,3-trifluoropropyl)trimethoxysilane (FAS3), (tridecafluoro-1,1,2,2-tetrahydrooctyl)trimethoxysilane (FAS13), (heptadecafluoro-1,1,2,2-tetrahydrodecyl)trimethoxysilane (FAS17), and (heptadecafluoro-1,1,2,2-tetrahydrodecyl)trichlorosilane (FAS17-Cl) were formed by chemical vapor surface modification (CVSM) on silica lens surfaces cleaned by exposure to vacuum ultraviolet (VUV) light at 172 nm. Changes in monolayer-modified lens surfaces concomitant with repeating a cycle of curing to induce the radical polymerization of a UVcurable resin and detaching the UV-cured resin were monitored by contact angle measurement with water and atomic force microscopy to investigate the property of the adsorbed monolayers as antisticking layers in UV nanoimprint lithography. A decrease of the contact angle for water with increasing the number of repeated cycles was mainly responsible for the removal of surface impurities in the form of nanoparticles on detaching the cured resin repeatedly. It was found that recoating the silica lens surface with monolayers from FAS13, FAS17, and FAS17-Cl after cleaning by VUV-light exposure resulted in the suppression of the decrease in the contact angle. These results indicate that the durability of an antisticking layer in UV nanoimprint lithography is markedly improved by the recoating.

    本文言語English
    ページ(範囲)06GL121-06GL126
    ジャーナルJapanese journal of applied physics
    49
    6 PART 2
    DOI
    出版ステータスPublished - 2010 6月 1

    ASJC Scopus subject areas

    • 工学(全般)
    • 物理学および天文学(全般)

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