Ellipsometric Analysis of Growth Process of Oxidation Films on Magnesium and its Alloys in Neutral Aqueous Solutions

Nobuyoshi Hara, Daisuke Kagaya, Noboru Akao

研究成果: Chapter

7 被引用数 (Scopus)

抄録

This chapter presents a study in which the growth process of oxidation films on pure magnesium (Mg), and AZ31B, and AZ91D alloys in pure water, Na2SO4, and NaCl solutions are analyzed by in-situ ellipsometry. The films with a refractive index of 1.42 - 1.47 grew rapidly in two consecutive stages. In stage I, the film thickness increases approximately linearly with time, and in stage II, the growth rate decreases with time. In every solution, the film growth rate of 6N-Mg was higher than that of AZ91D. The oxidation films were mainly composed of Mg(OH)2. The film growth rate of Mg-based materials depended on their purity and composition and the kind of electrolyte. The results of XPS analysis suggested that the oxidation films formed on AZ91D alloy in air and aqueous solutions are mainly composed of MgCO3 and Mg(OH)2, respectively. Anodic polarization curves measured after immersion in 0.1M NaCl suggested that the films formed on high purity Mg and AZ91D alloy have protective ability, while they suffer local breakdown at high potentials. The intrinsic passivity region of Mg was clearly observed on high purity Mg.

本文言語English
ホスト出版物のタイトルPassivation of Metals and Semiconductors, and Properties of Thin Oxide Layers
出版社Elsevier
ページ217-223
ページ数7
ISBN(印刷版)9780444522245
DOI
出版ステータスPublished - 2006 12 1

ASJC Scopus subject areas

  • Chemical Engineering(all)

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