Electron-ion-ion triple-coincidence spectroscopic study of site-specific fragmentation caused by Si:2p core-level photoionization of F3 SiCH2 CH2 Si (CH3) 3 vapor

S. Nagaoka, G. Prümper, H. Fukuzawa, M. Hino, M. Takemoto, Y. Tamenori, J. Harries, I. H. Suzuki, O. Takahashi, K. Okada, K. Tabayashi, X. J. Liu, T. Lischke, K. Ueda

研究成果: Article査読

32 被引用数 (Scopus)

抄録

Site-specific fragmentation caused by Si:2p core-level photoionization of F3 SiCH2 CH2 Si (CH3) 3 vapor was studied by means of high-resolution energy-selected-electron photoion-photoion triple-coincidence spectroscopy. The ab initio molecular orbital method was used for the theoretical description. F3 SiCH2 CH2 + - Si (CH3) 3 + ion pairs were produced by the 2p photoionization of the Si atoms bonded to the three methyl groups, and SiF+ -containing ion pairs were produced by the 2p photoionization of the Si atoms bonded to the three F atoms.

本文言語English
論文番号020502
ジャーナルPhysical Review A - Atomic, Molecular, and Optical Physics
75
2
DOI
出版ステータスPublished - 2007 2 20

ASJC Scopus subject areas

  • Atomic and Molecular Physics, and Optics

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