Electron beam irradiation-induced reduction of Sn on epitaxial rutile SnxTi1-xO2 alloy thin films

Yutaro Komuro, Hiroshi Kumigashira, Masaharu Oshima, Yuji Matsumoto

研究成果: Article査読

2 被引用数 (Scopus)

抄録

Epitaxially-grown SnxTi1 - xO2 alloy thin films with different compositions were fabricated by successive deposition of SnO2 on ultra-smooth Nb-doped TiO2 (rutile) (110) substrates. The surface Sn atoms of the SnxTi1 - xO 2, which took a tetravalent state just after the deposition under the present condition, were reduced into a metallic state by electron beam irradiation, but not for a pure SnO2 film. The reduction process approximately obeys zero-order kinetics; the reaction rate constant linearly increases with an increase of the surface composition of Ti. Based on these results, the reduction mechanism is discussed.

本文言語English
ページ(範囲)2555-2558
ページ数4
ジャーナルThin Solid Films
519
8
DOI
出版ステータスPublished - 2011 2 1
外部発表はい

ASJC Scopus subject areas

  • Electronic, Optical and Magnetic Materials
  • Surfaces and Interfaces
  • Surfaces, Coatings and Films
  • Metals and Alloys
  • Materials Chemistry

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