Electron beam irradiation-induced reduction of Sn on epitaxial rutile SnxTi1-xO2 alloy thin films

Yutaro Komuro; Hiroshi Kumigashira; Masaharu Oshima; Yuji Matsumoto

doi:10.1016/j.tsf.2010.11.048

Electron beam irradiation-induced reduction of Sn on epitaxial rutile Sn_xTi_1-xO₂ alloy thin films

Yutaro Komuro, Hiroshi Kumigashira, Masaharu Oshima, Yuji Matsumoto

研究成果: Article › 査読

2 被引用数 (Scopus)

抄録

Epitaxially-grown Sn_xTi_{1 - x}O₂ alloy thin films with different compositions were fabricated by successive deposition of SnO₂ on ultra-smooth Nb-doped TiO₂ (rutile) (110) substrates. The surface Sn atoms of the Sn_xTi_{1 - x}O ₂, which took a tetravalent state just after the deposition under the present condition, were reduced into a metallic state by electron beam irradiation, but not for a pure SnO₂ film. The reduction process approximately obeys zero-order kinetics; the reaction rate constant linearly increases with an increase of the surface composition of Ti. Based on these results, the reduction mechanism is discussed.

本文言語	English
ページ（範囲）	2555-2558
ページ数	4
ジャーナル	Thin Solid Films
巻	519
号	8
DOI	https://doi.org/10.1016/j.tsf.2010.11.048
出版ステータス	Published - 2011 2 1
外部発表	はい

ASJC Scopus subject areas

Electronic, Optical and Magnetic Materials
Surfaces and Interfaces
Surfaces, Coatings and Films
Metals and Alloys
Materials Chemistry

文献へのアクセス

10.1016/j.tsf.2010.11.048

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引用スタイル

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title = "Electron beam irradiation-induced reduction of Sn on epitaxial rutile SnxTi1-xO2 alloy thin films",

abstract = "Epitaxially-grown SnxTi1 - xO2 alloy thin films with different compositions were fabricated by successive deposition of SnO2 on ultra-smooth Nb-doped TiO2 (rutile) (110) substrates. The surface Sn atoms of the SnxTi1 - xO 2, which took a tetravalent state just after the deposition under the present condition, were reduced into a metallic state by electron beam irradiation, but not for a pure SnO2 film. The reduction process approximately obeys zero-order kinetics; the reaction rate constant linearly increases with an increase of the surface composition of Ti. Based on these results, the reduction mechanism is discussed.",

keywords = "Alloys, Auger electron spectroscopy, Thin film, Tin oxides, Titanium oxide",

author = "Yutaro Komuro and Hiroshi Kumigashira and Masaharu Oshima and Yuji Matsumoto",

note = "Funding Information: This work has been performed under the approval of the Photon Factory Program Advisory Committee (Proposal No. 2005G115 and No. 2007G622), and partially supported by Grant-in-Aid from the Ministry of Education, Culture, Sports, Science and Technology of Japan (No. 17686056 ).",

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T1 - Electron beam irradiation-induced reduction of Sn on epitaxial rutile SnxTi1-xO2 alloy thin films

AU - Komuro, Yutaro

AU - Kumigashira, Hiroshi

AU - Oshima, Masaharu

AU - Matsumoto, Yuji

N1 - Funding Information: This work has been performed under the approval of the Photon Factory Program Advisory Committee (Proposal No. 2005G115 and No. 2007G622), and partially supported by Grant-in-Aid from the Ministry of Education, Culture, Sports, Science and Technology of Japan (No. 17686056 ).

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N2 - Epitaxially-grown SnxTi1 - xO2 alloy thin films with different compositions were fabricated by successive deposition of SnO2 on ultra-smooth Nb-doped TiO2 (rutile) (110) substrates. The surface Sn atoms of the SnxTi1 - xO 2, which took a tetravalent state just after the deposition under the present condition, were reduced into a metallic state by electron beam irradiation, but not for a pure SnO2 film. The reduction process approximately obeys zero-order kinetics; the reaction rate constant linearly increases with an increase of the surface composition of Ti. Based on these results, the reduction mechanism is discussed.

AB - Epitaxially-grown SnxTi1 - xO2 alloy thin films with different compositions were fabricated by successive deposition of SnO2 on ultra-smooth Nb-doped TiO2 (rutile) (110) substrates. The surface Sn atoms of the SnxTi1 - xO 2, which took a tetravalent state just after the deposition under the present condition, were reduced into a metallic state by electron beam irradiation, but not for a pure SnO2 film. The reduction process approximately obeys zero-order kinetics; the reaction rate constant linearly increases with an increase of the surface composition of Ti. Based on these results, the reduction mechanism is discussed.

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KW - Thin film

KW - Tin oxides

KW - Titanium oxide

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