Electrochemical and XPS studies of the passivation behavior of sputter-deposited Cr-Ta alloys in 12 M HCl

X. Y. Li, E. Akiyama, H. Habazaki, A. Kawashima, K. Asami, K. Hashimoto

研究成果: Article査読

13 被引用数 (Scopus)

抄録

The sputter-deposited Cr-Ta alloys show extremely high corrosion resistance in 12 M HCl. The open circuit potentials of the Cr-Ta alloys are located in the passive regions of both chromium and tantalum, and all Cr-Ta alloys are spontaneously passivated. XPS analysis indicates that the composition and thickness of the air-formed film are the same as those of spontaneously passivated film, and the composition of the passive films becomes constant after prolonged immersion. The film consists of a double oxyhydroxide of chromium and tantalum cations. The formation of the homogeneous double oxyhydroxide film consisting of both chromium and tantalum cations by air oxidation is responsible for the extremely high corrosion resistance of the Cr-Ta alloys in comparison with the corrosion resistance of chromium and tantalum metals.

本文言語English
ページ(範囲)1587-1604
ページ数18
ジャーナルCorrosion Science
40
9
DOI
出版ステータスPublished - 1998 9月 1

ASJC Scopus subject areas

  • 化学 (全般)
  • 化学工学(全般)
  • 材料科学(全般)

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