Electrochemical and XPS studies of the corrosion behavior of sputter-deposited amorphous W-Zr alloys in 6 and 12 M HCl solutions

J. Bhattarai, E. Akiyama, H. Habazaki, A. Kawashima, K. Asami, K. Hashimoto

研究成果: Article査読

29 被引用数 (Scopus)

抄録

Amorphous W-Zr alloys containing 23-76 at% zirconium have been successfully prepared by DC magnetron sputtering. The W-Zr alloys are spontaneously passive and show significantly high corrosion resistance in 6 and 12 M HCl solutions. In particular, their corrosion resistance in 12 M HCl is higher than that of the alloy constituents. The pitting resistance of zirconium is greatly improved by alloying with tungsten. XPS analysis showed that zirconium is enriched in both the air-formed films and the passive films in HCl solutions. From angular-dependent XPS measurements, the passive films on W-Zr alloys are found to be composed of the double oxyhydroxide of tungsten and zirconium ions, although there are some concentration gradients of tungsten and zirconium ions. The formation of the homogeneous double oxyhydroxide of tungsten and zirconium ions acts synergistically in improving the corrosion resistance of W-Zr alloys in HCl solutions open to air at 30°C.

本文言語English
ページ(範囲)355-375
ページ数21
ジャーナルCorrosion Science
39
2
DOI
出版ステータスPublished - 1997 2

ASJC Scopus subject areas

  • 化学 (全般)
  • 化学工学(全般)
  • 材料科学(全般)

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