Electrically conducting, ultra-sharp, high aspect-ratio probes for AFM fabricated by electron-beam-induced deposition of platinum

Jason Brown, Paul Kocher, Chandra S. Ramanujan, David N. Sharp, Keiichi Torimitsu, John F. Ryan

研究成果: Article査読

17 被引用数 (Scopus)

抄録

We report on the fabrication of electrically conducting, ultra-sharp, high-aspect ratio probes for atomic force microscopy by electron-beam-induced deposition of platinum. Probes of 4.0 ±1.0. nm radius-of-curvature are routinely produced with high repeatability and near-100% yield. Contact-mode topographical imaging of the granular nature of a sputtered gold surface is used to assess the imaging performance of the probes, and the derived power spectral density plots are used to quantify the enhanced sensitivity as a function of spatial frequency. The ability of the probes to reproduce high aspect-ratio features is illustrated by imaging a close-packed array of nanospheres. The electrical resistance of the probes is measured to be of order 100. kΩ.

本文言語English
ページ(範囲)62-66
ページ数5
ジャーナルUltramicroscopy
133
DOI
出版ステータスPublished - 2013 10月 1
外部発表はい

ASJC Scopus subject areas

  • 電子材料、光学材料、および磁性材料
  • 原子分子物理学および光学
  • 器械工学

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