Electrical activation of Te and Se in GaAs at extremely heavy doping up to 5×1020 cm-3 prepared by intermittent injection of TEG/AsH3 in ultra-high vacuum

Yutaka Oyama, Jun ichi Nishizawa, Kohichi Seo, Ken Suto

研究成果: Article

9 引用 (Scopus)

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Doping characteristics of group VI elements (Te and Se) on (1 0 0)-oriented GaAs are investigated at an extremely heavy doping level up to 5×1020 cm-3 on the basis of the surface stoichiometry control to improve the incorporation of impurities. By changing the gas injection sequences, the surface stoichiometry before the introduction of impurity precursors is controlled. The impurity concentration is measured by secondary ion mass spectroscopy (SIMS) analysis and the activation ratio is determined in conjunction with the results of Hall effect measurements. It is shown that the incorporation of Te and Se is extremely enhanced when DETe and DESe are exposed on the Ga-stabilized surface. From the electrical measurements and SIMS results, the segregation of defects due to doped impurity atoms is strongly suggested. The defect formation mechanism of heavily impurity doped GaAs is discussed in view of the formation of impurity-defect complex and the control of site-occupation of doped impurities.

元の言語English
ページ(範囲)402-410
ページ数9
ジャーナルJournal of Crystal Growth
212
発行部数3
DOI
出版物ステータスPublished - 2000 1 1

ASJC Scopus subject areas

  • Condensed Matter Physics
  • Inorganic Chemistry
  • Materials Chemistry

フィンガープリント Electrical activation of Te and Se in GaAs at extremely heavy doping up to 5×10<sup>20</sup> cm<sup>-3</sup> prepared by intermittent injection of TEG/AsH<sub>3</sub> in ultra-high vacuum' の研究トピックを掘り下げます。これらはともに一意のフィンガープリントを構成します。

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