Electric field effect in pulsed laser deposition of epitaxial ZnO thin film

C. Hirose, Y. Matsumoto, Y. Yamamoto, H. Koinuma

研究成果: Article査読

11 被引用数 (Scopus)

抄録

We have developed a new system in which thin films can be pulsed laser deposited under an external electric field. Application of 1 kV high voltage to a thin metal wire placed 1 mm above an edge of a 14 mm long substrate distributes electric fields ranging from 4500 V/cm at the left to 50 V/cm at the right side of the substrate. The crystallinity of the ZnO thin film was remarkably improved in the area where the electric field higher than +100 V/cm was applied during the film deposition. Thus, the film growth of ZnO with a strong polarity along the c-axis was verified to depend on an external electric field.

本文言語English
ページ(範囲)807-809
ページ数3
ジャーナルApplied Physics A: Materials Science and Processing
79
4-6
DOI
出版ステータスPublished - 2004
外部発表はい

ASJC Scopus subject areas

  • 化学 (全般)
  • 材料科学(全般)

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