TY - JOUR
T1 - Effects of substrate temperature on physical properties of microrod-type multiferroic composite thin films fabricated by metal organic chemical vapor deposition
AU - Migita, Tsubasa
AU - Kobune, Masafumi
AU - Ito, Ryoga
AU - Obayashi, Taiki
AU - Takasaki, Hideyuki
AU - Ito, Ryo
AU - Kikuchi, Takeyuki
AU - Fujisawa, Hironori
AU - Kanda, Kensuke
AU - Maenaka, Kazusuke
AU - Hayashi, Yamato
N1 - Publisher Copyright:
© 2020 The Japan Society of Applied Physics.
PY - 2020/11/1
Y1 - 2020/11/1
N2 - Microrod-type CoFe2O4(CFO)/Bi3.25Nd0.65Eu0.10Ti3O12(00ℓ) (BNEuT) composite thin films were fabricated by a combination of high-temperature sputtering, reactive ion etching, and metal organic chemical vapor deposition (MOCVD) on Pt(100)/MgO(100) substrates. The substrate temperature for MOCVD was varied from 450 °C to 600 °C to examine its effect on the structural, magnetic, and ferroelectric properties. The substrate temperature affects the compressive stress at the interface between the CFO and BNEuT. The surface morphology changed drastically above 550 °C. The room temperature magnetization-magnetic field hysteresis loops for the films showed clear ferromagnetic hysteresis loop and magnetic shape anisotropy. The room temperature polarization-electric field (P-E) hysteresis loops for the films showed a clear ferroelectric hysteresis loop, and slightly leaky P-E hysteresis loop. The coercive field increased slightly with increasing substrate temperature. Judging from the structural, ferromagnetic, and ferroelectric properties, the film deposited at 550 °C has potential as an excellent multiferroic material.
AB - Microrod-type CoFe2O4(CFO)/Bi3.25Nd0.65Eu0.10Ti3O12(00ℓ) (BNEuT) composite thin films were fabricated by a combination of high-temperature sputtering, reactive ion etching, and metal organic chemical vapor deposition (MOCVD) on Pt(100)/MgO(100) substrates. The substrate temperature for MOCVD was varied from 450 °C to 600 °C to examine its effect on the structural, magnetic, and ferroelectric properties. The substrate temperature affects the compressive stress at the interface between the CFO and BNEuT. The surface morphology changed drastically above 550 °C. The room temperature magnetization-magnetic field hysteresis loops for the films showed clear ferromagnetic hysteresis loop and magnetic shape anisotropy. The room temperature polarization-electric field (P-E) hysteresis loops for the films showed a clear ferroelectric hysteresis loop, and slightly leaky P-E hysteresis loop. The coercive field increased slightly with increasing substrate temperature. Judging from the structural, ferromagnetic, and ferroelectric properties, the film deposited at 550 °C has potential as an excellent multiferroic material.
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U2 - 10.35848/1347-4065/aba9b4
DO - 10.35848/1347-4065/aba9b4
M3 - Article
AN - SCOPUS:85091088975
VL - 59
JO - Japanese Journal of Applied Physics, Part 1: Regular Papers & Short Notes
JF - Japanese Journal of Applied Physics, Part 1: Regular Papers & Short Notes
SN - 0021-4922
IS - SP
M1 - SPPB08
ER -