Effects of silicon source gas and substrate bias on the film properties of Si-incorporated diamond-like carbon by radio-frequency plasma-enhanced chemical vapor deposition

Hideki Nakazawa, Takeshi Kinoshita, Yuhta Kaimori, Yuhki Asai, Maki Suemitsu, Toshimi Abe, Kanji Yasui, Tetsuo Endoh, Takashi Itoh, Yuzuru Narita, Yoshiharu Enta, Masao Mashita

研究成果: Article査読

9 被引用数 (Scopus)

フィンガープリント 「Effects of silicon source gas and substrate bias on the film properties of Si-incorporated diamond-like carbon by radio-frequency plasma-enhanced chemical vapor deposition」の研究トピックを掘り下げます。これらがまとまってユニークなフィンガープリントを構成します。

Engineering & Materials Science

Physics & Astronomy