Effects of chamber pressure on current-voltage characteristic of metal-insulator-metal element in heat-treating anodized Ta2O5 film

Hong Wu Liu, Chun Xiao Gao, Wang Hui, Qi Liang Cui, Guang Tian Zou, Xi Min Huang

研究成果: Article査読

抄録

Ta/anodized Ta2 O5/Al is used as metal-insulator-metal (MIM) element, in experiments. The current -voltage (I-V) characteristic of the MIM element depends on the chamber pressure in heat-treating anodixed Ta2 O5 film. Good nonlinear I-V characteristic has been obtained in the pressure range from 10-2 to 10-4 Torr. Meanwhile, the conductivity coefficient α of the Poole-Frenkel (PF) equation which describes the I-V characteristic can be regulated by about two orders of magnitude in this pressure range, while the non-linearity coefficient β of the PF equation is not affected by the chamber pressure. * Supported by the National Natural Science Foundation of China under Grant Nos, C9576012 and 59631060.

本文言語English
ページ(範囲)838-840
ページ数3
ジャーナルChinese Physics Letters
16
11
DOI
出版ステータスPublished - 1999
外部発表はい

ASJC Scopus subject areas

  • 物理学および天文学(全般)

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