Effect of surface contamination on destruction and recrystallization dynamics of MgO protecting layer in plasma display panel by molecular dynamics simulation method

Momoji Kubo, Kazumi Serizawa, Hiromi Kikuchi, Riadh Sahnoun, Michihisa Koyama, Hideyuki Tsuboi, Nozomu Hatakeyama, Akira Endou, Hiromitsu Takaba, Carlos A. Del Carpio, Hiroshi Kajiyama, Tsutae Shinoda, Akira Miyamoto

研究成果: Paper査読

1 被引用数 (Scopus)

抄録

Our original molecular dynamics code was applied to the destruction dynamics of MgO protecting layer in the plasma display panel by Xe sputtering. The effect of surface contamination on the destruction and recrystallization dynamics of the MgO protecting layer was clarified. Especially, we elucidated that adsorbed water molecules are dissociated and hydrogen atoms are intruded into the MgO surface by Xe sputtering. These phenomena were suggested to degrade significantly the second electron emission ability of the MgO protecting layer.

本文言語English
ページ787-790
ページ数4
出版ステータスPublished - 2007 12 1
イベント14th International Display Workshops, IDW '07 - Sapporo, Japan
継続期間: 2007 12 52007 12 5

Other

Other14th International Display Workshops, IDW '07
国/地域Japan
CitySapporo
Period07/12/507/12/5

ASJC Scopus subject areas

  • 電子工学および電気工学
  • 電子材料、光学材料、および磁性材料
  • 放射線学、核医学およびイメージング
  • 原子分子物理学および光学

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