抄録
Our original molecular dynamics code was applied to the destruction dynamics of MgO protecting layer in the plasma display panel by Xe sputtering. The effect of surface contamination on the destruction and recrystallization dynamics of the MgO protecting layer was clarified. Especially, we elucidated that adsorbed water molecules are dissociated and hydrogen atoms are intruded into the MgO surface by Xe sputtering. These phenomena were suggested to degrade significantly the second electron emission ability of the MgO protecting layer.
本文言語 | English |
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ページ | 787-790 |
ページ数 | 4 |
出版ステータス | Published - 2007 12月 1 |
イベント | 14th International Display Workshops, IDW '07 - Sapporo, Japan 継続期間: 2007 12月 5 → 2007 12月 5 |
Other
Other | 14th International Display Workshops, IDW '07 |
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国/地域 | Japan |
City | Sapporo |
Period | 07/12/5 → 07/12/5 |
ASJC Scopus subject areas
- 電子工学および電気工学
- 電子材料、光学材料、および磁性材料
- 放射線学、核医学およびイメージング
- 原子分子物理学および光学