The cycle of short time passivation and the following weak reduction was repeated and oxidation film of a few atomic layers were formed and relaxed for a designed time at each cycle. In other wards, passive film was generated by dis-continuous passivation method such as layer-by-layer fabrication in a sub-nanometer scale. Then atomically flat surface was fabricated on the dis-continuous passivation film.
|ホスト出版物のタイトル||Nanotechnology (General) - 216th ECS Meeting|
|出版社||Electrochemical Society Inc.|
|出版ステータス||Published - 2009|
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