Effect of nitrogen-doped LaB6 interfacial layer on device characteristics of pentacene-based OFET

Yasutaka Maeda, Shun Ichiro Ohmi, Tetsuya Goto, Tadahiro Ohmi

研究成果: Article査読

9 被引用数 (Scopus)

抄録

In this paper, the effect of a nitrogen-doped (N-doped) LaB6 interfacial layer (IL) on p-type pentacene-based OFET was investigated. The pentacene-based OFET with top-contact/back-gate geometry was fabricated. A 2-nm-thick N-doped LaB6 interfacial layer deposited on an 8-nm-thick SiO2 gate insulator. A 10-nm-thick pentacene film was deposited by thermal evaporation at 100°C followed by Au contact and Al back gate electrodes formation. The fabricated OFET showed normally-off characteristics and a steep subthreshold swing (SS) of 84 mV/dec. from ID-VG and ID-VD characteristics. Furthermore, the aging characteristics of 6 months after the fabrication were investigated and it was found that VTH and SS were stable when the N-doped LaB6 IL was introduced at the interface between SiO2 gate insulator and pentacene.

本文言語English
ページ(範囲)463-467
ページ数5
ジャーナルIEICE Transactions on Electronics
E100C
5
DOI
出版ステータスPublished - 2017 5

ASJC Scopus subject areas

  • Electronic, Optical and Magnetic Materials
  • Electrical and Electronic Engineering

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