Effect of Ar/Ar-H2 plasma arc melting on Cu purification

Jae Won Lim, Min Seuk Kim, N. R. Munirathnam, Minh Tung Le, Masahito Uchikoshi, Kouji Mimura, Minoru Isshiki, Hyuk Chon Kwon, Good Sun Choi

研究成果: Article査読

10 被引用数 (Scopus)

抄録

Removal of impurities from Cu metal by Ar and Ar-20%H2 plasma arc melting (PAM) has been carried out. Several impurities such as Li, Na, Mg, P, S, Cl, K, Ca, Zn, Pd, Pb and Bi in Cu were efficiently removed when only Ar plasma gas was used. Moreover, removal degrees for the above mentioned impurities were significantly increased after Ar-20%H2-PAM, especially for K, Zn and Pd. It was found that Ar-H2 PAM showed an excellent effect to eliminate impurities with higher vapor pressures than that of Cu metal.

本文言語English
ページ(範囲)1826-1829
ページ数4
ジャーナルMaterials Transactions
49
8
DOI
出版ステータスPublished - 2008 8

ASJC Scopus subject areas

  • 材料科学(全般)
  • 凝縮系物理学
  • 材料力学
  • 機械工学

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